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Work Description - Multi Target Uhv Sputtering System System Should Consist Of Deposition Chamber And Load Lock Chamber With Ultra High Vacuum. Sputtering Chamber Should Be Provided With 6 Sputter Cathodes Of Dc. Load Lock Chamber With A Rf Sputtering Gun.
The University of Hyderabad, a Central Government Ministry/Department, invites global tenders for the procurement of a Multitarget UHV Sputtering System. This system, valued at ₹2,75,00,000, requires a deposition chamber and a load lock chamber, both operating under Ultra High Vacuum conditions. The sputtering chamber must be equipped with six DC...read more
Supply And Installation Of Rf-dc Uhv Sputter Deposition System For The..read more
Tem- Geophysical Resistivity System..read more
Plc (programmable Logic Controller) System..read more
1 Tenders
1 Tenders